Hangzhou Lion Microelectronics Co., Ltd.
date：2018-01-26 browser：80
Project name: FAB-C1 Electromechanical Engineering of Hangzhou Lion Microelectronics Co., Ltd.
FAB-D Engineering of Hangzhou Lion Dong Core Microelectronics Co., Ltd./Arsenic-containing Wastewater Engineering of Hangzhou Lion Dong Core Microelectronics Co., Ltd.
Work place: No. 199, No. 20 Avenue, Xiasha Economic Development Zone, Hangzhou
Construction unit: Hangzhou Lion Microelectronics Co., Ltd.
Construction area: 15,840 m2
Introduction: Hangzhou Lion Microelectronics Co., Ltd. is located in Economic and Technological Development Zone of Hangzhou and power device are mainly regarded as the main production.It added production line for 6-inch circuit wafer of gallium arsenide microwave radio frequency (RF) in 2016.
Project introduction: The Company was responsible for clean room for MOS production line in 2015, with an area of about 3,000 m2.
The Company was responsible for clean room of production line for circuit wafer of gallium arsenide microwave radio frequency (RF) in 2016, with an area of about 3,000 m2.
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